Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine

Metal Sputtering Targets Gr1 Gr2 Gr5 Titanium Sputtering Silver Sputtering Target For PVD Vacuum Coating Machine

Product Details:

Grade: Gr1 Gr2 Gr5 Titanium ,TiAl, TiCr, TiCu,TiSi,Mo,Cr etc. As customers' requests

Size: 60/65/70/80/85/90/95/100(D)/200/300/400×20/30/32/35/40/42/45/50(T) Or as customers' requests

Surface: bright surface

Application: Coating industry, sputtering vacuum coating industry

Chemical Requirements:

Product name: Titanium target sputtering

Material: Pure titanium: GR1 GR2

Purity >= 99.6%

Application:Hardware, decoration, tools, ceramics, golf and other coating industries.

Dimension:

Round sputtering target: Φ100×40, Φ95×45, Φ80×40, Φ90×40, Φ85×35 and other specific sizes.

Tube sputtering target: Φ70×7×L900--2000mm, Φ89.4mmX7.62mmX1728mm,Φ89.4mmX15mmX1728mm, Φ80mmX10mmX1728mm, and other specific sizes.

Plate sputtering target: T6-40×W60--800×L600--2000mm and other specific sizes.

We can customize alloy targets in different proportions according to customer needs

Titanium sputter targets are essential materials used in various advanced manufacturing processes, particularly in thin-film deposition technologies such as sputtering. These targets are widely utilized in the production of coatings for a variety of applications, including electronics, semiconductors, aerospace, and nanomaterials. Here's an in-depth look at these materials, their applications, and specifications.

1. What is a Titanium Sputter Target?

A sputter target is a material used in sputtering deposition, a method of thin-film deposition. In sputtering, a target material is bombarded by energetic ions (usually from a plasma) causing atoms to be ejected (sputtered) and deposited onto a substrate, creating a thin, uniform coating. Titanium sputter targets are specifically used to deposit thin titanium films on a variety of surfaces, providing beneficial properties such as corrosion resistance, wear resistance, and enhanced durability.

2. Types of Titanium Sputter Targets

There are several variations of titanium sputter targets, each offering unique properties and applications:

• Titanium (Ti) Sputter Targets:
  Pure titanium (Gr1, Gr2, Gr5) targets are widely used for depositing titanium films. These targets can be used for a variety of applications requiring strong, durable coatings with excellent corrosion resistance.

• Titanium-Aluminum (TiAl) Sputter Targets:
  TiAl sputter targets are a combination of titanium and aluminum. This alloy is often used in the production of hard, wear-resistant films with specific applications in aerospace and semiconductors.

• Titanium-Chromium (TiCr) Sputter Targets:
  TiCr targets are useful for depositing films that have enhanced hardness and wear resistance. They are often employed in magnetic storage media, semiconductors, and optical coatings.

• Titanium-Copper (TiCu) Sputter Targets:
  TiCu sputtering targets combine the properties of titanium and copper. Copper provides high electrical and thermal conductivity, making these targets ideal for microelectronics and thin-film transistors.

• Titanium-Silicon (TiSi) Sputter Targets:
  TiSi sputter targets are used for producing films with specific thermal stability and chemical resistance, commonly employed in semiconductor devices, microelectronic components, and optical coatings.

• Zirconium (Zr) Sputter Targets:
  Zirconium sputter targets are often used in applications that require high corrosion resistance, oxidation resistance, and wear resistance. These are commonly applied in aerospace, nuclear, and optical coatings.

• Chromium (Cr) Sputter Targets:
  Cr sputter targets are used for depositing hard, wear-resistant coatings and for decorative finishes on surfaces. These are common in the automotive, aerospace, and tooling industries.

• Molybdenum (Mo) Sputter Targets:
  Molybdenum sputter targets provide high-temperature stability and are ideal for applications in electronics, photovoltaics, and optical coatings.

3. Material Grades of Titanium Sputter Targets

• Grade 1 (Gr1): Commercially pure titanium with excellent corrosion resistance, but lower strength. Suitable for applications that require high corrosion resistance but don’t need high mechanical strength, such as chemical equipment and medical implants.

• Grade 2 (Gr2): The most widely used commercially pure titanium grade, offering a balance of strength and corrosion resistance. It is used in aerospace, marine, and medical applications.

• Grade 5 (Gr5): Known as Ti-6Al-4V, this titanium alloy combines 6% aluminum and 4% vanadium for higher strength. This alloy is commonly used in aerospace, biomedical devices, and high-performance coatings.

4. Common Sizes of Titanium Sputter Targets

Titanium sputter targets come in various standard sizes, depending on the specific application and the requirements of the deposition system. Common diameters and thicknesses include:

• Φ100*40 mm
• Φ98*40 mm
• Φ95*45 mm
• Φ90*40 mm
• Φ85*35 mm
• Φ65*40 mm

In addition to these standard sizes, titanium sputter targets can be customized to meet specific customer requirements, whether based on specific dimensions or material compositions.

5. Target Requirements

The quality of a sputter target significantly impacts the quality of the deposited film. Key requirements for titanium sputter targets include:

• High Purity: High purity is essential to ensure that the deposited film is free from impurities, which could affect its properties or performance.

• Uniform Crystal Grains: The target should have a uniform crystal structure, which is important for consistent sputtering and the deposition of a uniform thin film.

• Good Compactness: The target should have a dense, well-formed structure to ensure that sputtering occurs evenly and efficiently.

• Low Contamination: The target should not contain impurities that could contaminate the deposition process, which is critical for high-precision applications like semiconductors and nanomaterials.

6. Applications of Titanium Sputter Targets

Titanium sputter targets are used in a variety of advanced manufacturing processes. Common applications include:

• Electronics: Sputtered titanium films are used for conductive layers, insulating films, and magnetic coatings in electronic devices such as smartphones, displays, and thin-film transistors.

• Semiconductors: Titanium and its alloys are used in semiconductor device fabrication for interconnects, capacitors, and other essential components.

• Aerospace: Titanium films are applied to components in aerospace and military applications, where high strength-to-weight ratios, corrosion resistance, and wear resistance are essential.

• Optical Coatings: Titanium sputter targets are used to deposit thin films for optical coatings (e.g., anti-reflective films, mirrors, and optical filters).

• Nanomaterials: Titanium films are utilized in the creation of nanomaterials with specific properties for catalysis, solar cells, battery electrodes, and nanotube applications.

• Medical Devices: Titanium sputtered films are used in biomedical applications, especially for creating biocompatible coatings on implants and surgical instruments.

Chemical requirements

Material:

1) Ti/Al alloy target (67:33,50:50at%)

2) W/Ti alloy target (90:10wt%),

3) Ni/V alloy target (93:7, wt%)

4) Ni/Cr alloy target (80:20, 70:30, wt%),

5) Al/Cr alloy target (70:30,50:50at%)

6) Nb/Zr alloy target (97:3,90:10wt%)

7) Si/Al alloy target (90:10, 95:5, 98:2, 70:30, wt%)

8) Zn/Al alloy target

9) High purity chromium target (99.95%, 99.995%)

10) Al/Cr alloy target (70:30, 50:50, 67:33, at%)

11) Ni/Cu alloy target (70:30, 80:20, wt%)

12) Al/Nd alloy target (98:2wt%)

13) Mo/Nb alloy target (90:10, wt%)

14) TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)

15)CrAlSi alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)

Understanding Titanium Grades

Titanium is classified into various grades based on its composition and properties. Grade 1 (Gr1) is commercially pure titanium, known for its excellent corrosion resistance and high ductility. Grade 2 (Gr2) is also commercially pure but with slightly higher strength, making it suitable for a broader range of applications. Grade 5 (Gr5), also known as Ti-6Al-4V, is an alloy containing aluminum and vanadium, offering superior strength-to-weight ratios, making it ideal for applications that demand high performance under stress.

TiAl alloys, which combine titanium with aluminum, provide enhanced hardness and thermal stability. This makes them particularly valuable for coatings that require excellent wear resistance and performance at elevated temperatures. The unique properties of these titanium grades and alloys make them favorable choices for various PVD applications, where the quality of the coating directly impacts the performance of the final product.

The Role of Sputtering Targets in PVD Coating

Sputtering targets are materials that are bombarded by high-speed charged particles during the PVD coating process. When these particles strike the target, atoms are ejected from its surface and deposited onto a substrate, forming a thin film. The choice of target material directly influences the properties of the resulting film, allowing for the customization of coatings to meet specific requirements. By selecting different target materials, such as aluminum, copper, or titanium alloys, manufacturers can produce films with varying characteristics, including super-hardness, wear resistance, and anti-corrosive properties.

In the case of titanium sputtering targets, the ability to produce films that exhibit superior adhesion, low friction, and high hardness is particularly beneficial. These properties are crucial for applications in industries such as aerospace, automotive, and medical technology, where components are subjected to extreme conditions and must maintain integrity over time. By utilizing Gr1, Gr2, Gr5, and TiAl titanium targets, manufacturers can achieve coatings that enhance the performance and longevity of critical components.

Understanding Sputtering Targets

Sputtering is a deposition technique used to create thin films on various substrates. The process involves bombarding a target material with energetic particles, typically ions, which eject atoms from the target's surface. These ejected atoms then deposit onto a substrate, forming a thin film. Sputtering is favored in medical applications for its ability to produce uniform coatings with precise control over thickness and composition.

Metal targets, including titanium, are particularly valuable in the medical sector due to their favorable mechanical properties, corrosion resistance, and biocompatibility. Titanium, in particular, is widely used for medical applications because of its strength-to-weight ratio and ability to integrate seamlessly with human tissue.

The Importance of Titanium in Medical Applications

Titanium is an exceptional material in the medical field, primarily due to its biocompatibility. It does not provoke significant immune responses, making it ideal for long-term implants such as orthopedic prosthetics and dental fixtures. Additionally, titanium's corrosion resistance ensures that it maintains its integrity in the harsh environments often found within the human body.

When used as a sputtering target, titanium can be customized to meet specific requirements for various medical devices. This customization involves adjusting parameters such as purity levels, grain structure, and compactness of the target material, which directly influences the properties of the deposited films.

Applications of Sputtering Targets in the Medical Industry

Customized titanium sputtering targets are used in a variety of medical applications, including:

• Orthopedic Implants: Titanium coatings enhance the surface properties of orthopedic devices, improving biocompatibility and reducing wear. This is crucial for implants that endure significant mechanical loads.

• Dental Implants: Sputtered titanium coatings improve the osseointegration of dental implants, promoting better bonding with surrounding bone tissue.

• Surgical Instruments: Coatings applied through sputtering can enhance the hardness and corrosion resistance of surgical tools, prolonging their lifespan and maintaining their performance through repeated sterilization cycles.

• Drug Delivery Systems: Innovative sputtering techniques allow for the development of ultrathin films that can facilitate controlled drug release, improving treatment efficacy.

Titanium in Medical Uses:

Titanium, especially Grade 1 and Grade 2, is highly regarded in medical and biomedical fields for its biocompatibility, strength, and lightweight characteristics. It's commonly used in medical devices because it is not harmful to the body and is not likely to cause allergic reactions.

Key Medical Uses of Titanium:

1. Orthopedic Implants: Titanium is commonly used in bone screws, plates, joint replacements, and spinal implants because it mimics the properties of bone.
2. Dental Implants: Titanium's biocompatibility and strength make it a perfect choice for dental implants that require high durability and resistance to corrosion.
3. Medical Instruments: Due to its corrosion resistance, surgical tools, needles, scalpels, and other medical instruments are often made from titanium or titanium alloys.
4. Prosthetics: Titanium is used in the production of prosthetic limbs and implants for its combination of lightweight and strength.
5. Cardiovascular Devices: Titanium is used in the production of pacemaker cases, stents, and valves due to its non-reactive nature in the human body.
6. Wear-resistant coatings: Titanium sputtering targets can be used to deposit thin coatings on medical devices to enhance wear resistance, reduce friction, and improve biocompatibility.

Titanium Grades:

Conclusion:

Titanium alloy sputtering targets, including TiAl alloys, are versatile materials widely used for coating applications in industries ranging from aerospace to electronics and biomedical. These materials provide exceptional properties such as strength, corrosion resistance, biocompatibility, and wear resistance, making them ideal for demanding applications that require durable, high-performance thin films. When choosing a titanium sputtering target, factors like alloy composition, purity, and target geometry must be considered to achieve optimal results in the sputtering process.